Total and Differential Sputtering Yields Explored by SRIM Simulations

Total sputtering yield and spatial distributions of sputtered atoms are important for numerous deposition techniques. We performed SRIM (Stopping Range Ions in Matter) simulations to analyze the total angular distribution a range single-element target materials. The were conducted normal argon ion incidence 300–1200 eV at an oblique angle selected energies. examined differential yields transition metals periods 4–6 groups (Ti, V, Cr; Zr, Nb, Mo; Hf, Ta, W) group 11 (Cu, Ag, Au) periodic table, other materials that relevant (B C; Al Si). For metals, increases with table. elements 4 (i.e., Ti, Hf) have lowest yield, while Cu, exhibit highest yield. shows cosine metal atoms. is more asymmetric lower energies, higher symmetrically. symmetry also depends on table atomic mass material. show most symmetric distribution, experience distribution. Furthermore, individual group, becomes heavier elements. detail influence surface binding energy, mass, energy These parameters analyzed regard simplified analytical formula which was derived by Sigmund. This modified introducing power fitting parameter, accounts non-linear dependence energy. equation provided good estimates ions energies up 1200 eV.